Cite
HARVARD Citation
Walter, R. et al. (n.d.). Large‐Area Low‐Cost Tunable Plasmonic Perfect Absorber in the Near Infrared by Colloidal Etching Lithography. Advanced optical materials. 3 (3), pp. 398-403. [Online].
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Walter, R. et al. (n.d.). Large‐Area Low‐Cost Tunable Plasmonic Perfect Absorber in the Near Infrared by Colloidal Etching Lithography. Advanced optical materials. 3 (3), pp. 398-403. [Online].