A new extra‐focus monochromator designed for high‐performance VUV beamlines. (3rd February 2015)

• Record Type: Journal Article
• Authors: Xue, Chaofan; Wu, Yanqing; Zou, Ying; Xue, Lian; Wang, Yong; Xu, Zijian; Tai, Renzhong
• Is Part Of: Journal of synchrotron radiation. Volume 22:Part 2(2015)
• Page Start: 328
• Page End: 335
• Publication Date: 2015-02-03
• Subjects: Synchrotron radiation -- Periodicals; Free electron lasers -- Periodicals; 539.73505
• DOI: 10.1107/S1600577514025260
• Languages: English
• ISSNs: 0909-0495

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>A new monochromator called an extra‐focus constant‐included‐angle varied‐line‐spacing (VLS) cylindrical‐grating monochromator (extra‐focus CIA‐VCGM) is described. This monochromator is based on the Hettrick–Underwood scheme where the plane VLS grating is replaced by a cylindrical one in order to zero the defocus at three reference photon energies in the vacuum‐ultraviolet range. It has a simple mechanical structure and a fixed focus spot with high performance over a wide energy range. Furthermore, its mechanical compatibility with a standard VLS plane‐grating monochromator allows convenient extension into the soft‐X‐ray range.</p> </abstract>