Chemical and physical properties in layers and interfaces of nanolayered Si(100)/Ni/BCxNy stacks. (23rd January 2015)

• Record Type: Journal Article
• Authors: Hoffmann, P.; Kosinova, M.; Flege, S.; Brötz, J.; Trunova, V.; Dietz, C.; Ensinger, W.
• Is Part Of: X-ray spectrometry. Volume 44:Number 2(2015)
• Page Start: 48
• Page End: 53
• Publication Date: 2015-01-23
• Subjects: X-ray spectroscopy -- Periodicals; 543.62
• DOI: 10.1002/xrs.2578
• Languages: English
• ISSNs: 0049-8246

Abstract

<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Layered stacks of the structure Si(100)/Ni/BC_xN_y were produced by physical (Ni) and chemical (BCN) vapor deposition. The BCN layers were deposited at temperatures of 200, 300, 400, and 500 °C. The resulting samples were characterized by ellipsometry, X‐ray photoelectron spectrometry, secondary ion mass spectrometry, atomic force microscopy, and X‐ray reflectometry. The formed structures of the samples synthesized at 200 and 500 °C, respectively, were determined. For the synthesis temperature of 200 °C, compounds with Ni–C bonds were found at the interface Ni/BC_xN_y. For the sample produced at 500 °C, compounds with Ni–Si bonds were identified, dispersed as particles or droplets in the corresponding interface. Copyright © 2015 John Wiley &amp; Sons, Ltd.</p> </abstract>