Phase Evolution of Ti3SiC2 Annealing in Vacuum at Elevated Temperatures. Issue 3 (8th March 2012)

• Record Type: Journal Article
• Authors: Zeng, Junling; Ren, Shufang; Lu, Jinjun
• Is Part Of: International journal of applied ceramic technology. Volume 10:Issue 3(2013:May/Jun.)
• Page Start: 527
• Page End: 539
• Publication Date: 2012-03-08
• Subjects: Ceramics -- Periodicals; Ceramics -- Technological innovations -- Periodicals; 620.1405
• DOI: 10.1111/j.1744-7402.2012.02760.x
• Languages: English
• ISSNs: 1546-542X

Abstract

<abstract abstract-type="main" id="ijac02760-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p>The thermal decomposition of Ti₃SiC₂ in vacuum furnace up to 1500°C has been investigated. The results show that the mild decomposition of Ti₃SiC₂ commences at 1300°C and the higher the holding temperature, the larger the volatilization of Si atoms. The Ti₃SiC₂ decomposition occurs simultaneously on the surface and in the bulk. Four phases coexist at 1400°C and 1450°C and the Ti₅Si₃C_x phase appears in the bulk and/or surface. Diffusion distance, rate, and volatilization of Si contribute to the porous structure and the presence of Ti₅Si₃C_x. The evolution of furnace pressure reflects the decomposition kinetics of Ti₃SiC₂.</p> </abstract>