Solvent‐Assisted Directed Self‐Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays. (13th May 2013)

• Record Type: Journal Article
• Authors: Gu, Weiyin; Xu, Ji; Kim, Jung‐Keun; Hong, Sung Woo; Wei, Xinyu; Yang, Xiaomin; Lee, Kim Y.; Kuo, David S.; Xiao, Shuaigang; Russell, Thomas P.
• Is Part Of: Advanced materials. Volume 25:Number 27(2013)
• Page Start: 3677
• Page End: 3682
• Publication Date: 2013-05-13
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201300899
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>The fabrication process for 5 Tb/in² bit patterns</bold> using solvent‐assisted directed self‐assembly is investigated. The <italic>N</italic>‐methyl‐2‐pyrrolidone solvent vapor‐annealing method was used to achieve good long‐range lateral ordering of low‐molecular‐weight polystyrene‐<italic>block</italic>‐polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg270v9g3s" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>