Ultralow Reflection from a‐Si Nanograss/Si Nanofrustum Double Layers. (5th February 2013)

• Record Type: Journal Article
• Authors: Ravipati, Srikanth; Shieh, Jiann; Ko, Fu‐Hsiang; Yu, Chen‐Chieh; Chen, Hsuen‐Li
• Is Part Of: Advanced materials. Volume 25:Number 12(2013)
• Page Start: 1724
• Page End: 1728
• Publication Date: 2013-02-05
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201204235
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>A double‐layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums</bold> (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near‐unity absorption and near‐zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of <italic>a</italic>‐Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg1v8vmg2c" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>