'Bubble‐Free' Electrochemical Delamination of CVD Graphene Films. Issue 2 (1st September 2014)

• Record Type: Journal Article
• Authors: Cherian, Christie Thomas; Giustiniano, Francesco; Martin‐Fernandez, Iñigo; Andersen, Henrik; Balakrishnan, Jayakumar; Özyilmaz, Barbaros
• Is Part Of: Small. Volume 11:Issue 2(2015)
• Page Start: 189
• Page End: 194
• Publication Date: 2014-09-01
• Subjects: Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.201402024
• Languages: English
• ISSNs: 1613-6810

Abstract

<abstract abstract-type="graphical" xml:lang="en" id="smll201402024-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>The production of large amounts of hydrogen bubbles, </bold> typical of electrochemical delamination methods based on the electrolysis of water, results in mechanical damage to graphene during the delamination, transfer, and drying steps. Here a novel 'bubble‐free' delamination method is introduced which exploits the electrochemical dissolution of native copper oxide at a potential lower than that required for the formation of hydrogen bubbles, enabling the production of defect‐free graphene stack. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgh31q0r9z4" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>