RF and broadband noise investigation in High‐k/Metal Gate 28‐nm CMOS bulk transistor‡. (6th January 2014)
- Record Type:
- Journal Article
- Title:
- RF and broadband noise investigation in High‐k/Metal Gate 28‐nm CMOS bulk transistor‡. (6th January 2014)
- Main Title:
- RF and broadband noise investigation in High‐k/Metal Gate 28‐nm CMOS bulk transistor‡
- Authors:
- Danneville, F.
Poulain, L.
Tagro, Y.
Lepilliet, S.
Dormieu, B.
Gloria, D.
Scheer, P.
Dambrine, G.
Crupi, Giovanni
Schreurs, Dominique
Caddemi, Alina - Abstract:
- <abstract abstract-type="main"> <title>SUMMARY</title> <p>In order to pursue Moore's law, material engineering has constituted a real focus during the last decade. In particular, the recent introduction of new Gate stack using High‐k dielectrics and Metal Gate (H‐<italic>k</italic>/MG) for CMOS was a key point to downscale the 'Equivalent Oxide Thickness'. Within this context, this paper intends to investigate radio frequency (RF) and broadband noise performance of a recent Low Power 28‐nm H‐<italic>k</italic>/MG CMOS Bulk Technology. For this purpose, S‐parameters carefully measured up to 110 GHz allowed the selection of the best RF transistor, leading to the best trade‐off for <italic>f</italic><sub>T</sub>/<italic>f</italic><sub>max</sub>. For this transistor, multi‐bias RF Small Signal Equivalent Circuit (SSEC) was extracted, while its noise performance was assessed through different noise measurement methods and within different frequency ranges. It turned out that H‐<italic>k</italic>/MG 28‐nm CMOS Technology offers a minimum noise figure NF<sub>min</sub> of 0.8 dB (with an associated gain <italic>G</italic><sub>a</sub> equal to 14 dB) at 20 GHz, for a quite low DC drain current of 135 mA/mm. Moreover, despite the aggressive length down‐scaling, the validity of the two‐temperature noise model was verified both in W band and through tuner based noise measurement in (6–18 GHz) frequency range. Finally, the noise performance were benchmarked with the best ones reported<abstract abstract-type="main"> <title>SUMMARY</title> <p>In order to pursue Moore's law, material engineering has constituted a real focus during the last decade. In particular, the recent introduction of new Gate stack using High‐k dielectrics and Metal Gate (H‐<italic>k</italic>/MG) for CMOS was a key point to downscale the 'Equivalent Oxide Thickness'. Within this context, this paper intends to investigate radio frequency (RF) and broadband noise performance of a recent Low Power 28‐nm H‐<italic>k</italic>/MG CMOS Bulk Technology. For this purpose, S‐parameters carefully measured up to 110 GHz allowed the selection of the best RF transistor, leading to the best trade‐off for <italic>f</italic><sub>T</sub>/<italic>f</italic><sub>max</sub>. For this transistor, multi‐bias RF Small Signal Equivalent Circuit (SSEC) was extracted, while its noise performance was assessed through different noise measurement methods and within different frequency ranges. It turned out that H‐<italic>k</italic>/MG 28‐nm CMOS Technology offers a minimum noise figure NF<sub>min</sub> of 0.8 dB (with an associated gain <italic>G</italic><sub>a</sub> equal to 14 dB) at 20 GHz, for a quite low DC drain current of 135 mA/mm. Moreover, despite the aggressive length down‐scaling, the validity of the two‐temperature noise model was verified both in W band and through tuner based noise measurement in (6–18 GHz) frequency range. Finally, the noise performance were benchmarked with the best ones reported for H‐<italic>k</italic>/MG CMOS technology up‐to‐date. Copyright © 2014 John Wiley &amp; Sons, Ltd.</p> </abstract> … (more)
- Is Part Of:
- International journal of numerical modelling. Volume 27:Number 5/6(2014)
- Journal:
- International journal of numerical modelling
- Issue:
- Volume 27:Number 5/6(2014)
- Issue Display:
- Volume 27, Issue 5/6 (2014)
- Year:
- 2014
- Volume:
- 27
- Issue:
- 5/6
- Issue Sort Value:
- 2014-0027-NaN-0000
- Page Start:
- 736
- Page End:
- 747
- Publication Date:
- 2014-01-06
- Subjects:
- Electric networks -- Mathematical models -- Periodicals
Electronics -- Mathematical models -- Periodicals
621.3011 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/jnm.1972 ↗
- Languages:
- English
- ISSNs:
- 0894-3370
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 4542.406200
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 4143.xml