A 513‐ppi FFS‐Mode TFT‐LCD using CAAC Oxide Semiconductor Fabricated by a 6‐Mask Proces. Issue 1 (June 2014)

• Record Type: Journal Article
• Authors: Yamashita, Akio; Kubota, Daisuke; Moriya, Koji; Kubota, Yusuke; Jikumaru, Mika; Nakano, Masaru; Baba, Haruyuki; Hirakata, Yoshiharu; Koyama, Jun; Yamazaki, Shunpei; Katayama, Masahiro; Misawa, Chieko; Matsukizono, Hiroshi; Kanzaki, Yohsuke; Kaneko, Seiji; Ueda, Naoki; Mori, Shigeyasu; Matsuo, Takuya
• Is Part Of: Digest of technical papers. Volume 45:Issue 1(2014)
• Page Start: 263
• Page End: 266
• Publication Date: 2014-06
• Subjects: Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/j.2168-0159.2014.tb00072.x
• Languages: English
• ISSNs: 0097-966X

Abstract

<abstract abstract-type="main"> <title>Abstract</title> <p>A driving method which does not need planarity for high definition and enables low frequency driving was examined. Further, a 513‐ppi FFS‐mode liquid crystal display (LCD) panel with high aperture ratio was fabricated via a six‐mask process, using a technique that combines an oxide semiconductor and an oxide conductor.</p> </abstract>