Atmospheric Pressure Plasma Initiated Chemical Vapor Deposition Using Ultra‐Short Square Pulse Dielectric Barrier Discharge. Issue 1 (22nd August 2014)

• Record Type: Journal Article
• Authors: Boscher, Nicolas D.; Hilt, Florian; Duday, David; Frache, Gilles; Fouquet, Thierry; Choquet, Patrick
• Is Part Of: Plasma processes and polymers. Volume 12:Issue 1(2015:Jan.)
• Page Start: 66
• Page End: 74
• Publication Date: 2014-08-22
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201400094
• Languages: English
• ISSNs: 1612-8850

Abstract

<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="ppap201400094-sec-0001" sec-type="section"> <p>A simple, efficient and scalable method for the atmospheric pressure plasma initiated chemical vapor deposition of conventional polymer is demonstrated. Ultra‐short square pulse dielectric barrier discharge, which allows high deposition rates even for plasma duty cycle as low as 0.01%, is used to deposit a glycidyl methacrylate (GMA) polymer layer. The polymer structure of the thin films is evidenced by matrix‐assisted laser desorption/ionization high‐resolution mass spectrometry. Polymer molecular weights up to 30 000 g mol⁻¹ are found by size exclusion chromatography (SEC), highlighting the suitability of the plasma initiated CVD method for the deposition of polymer layers.<inline-graphic xlink:href="ark:/27927/pgh372wm3sd" content-type="ppap201400094-gra-0001" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </sec> </abstract>