Refractory Plasmonics with Titanium Nitride: Broadband Metamaterial Absorber. (18th October 2014)

• Record Type: Journal Article
• Authors: Li, Wei; Guler, Urcan; Kinsey, Nathaniel; Naik, Gururaj V.; Boltasseva, Alexandra; Guan, Jianguo; Shalaev, Vladimir M.; Kildishev, Alexander V.
• Is Part Of: Advanced materials. Volume 26:Number 47(2014)
• Page Start: 7959
• Page End: 7965
• Publication Date: 2014-10-18
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201401874
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en" id="adma201401874-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>A high‐temperature stable broadband plasmonic absorber</bold> is designed, fabricated, and optically characterized. A broadband absorber with an average high absorption of 95% and a total thickness of 240 nm is fabricated, using a refractory plasmonic material, titanium nitride. This absorber integrates both the plasmonic resonances and the dielectric‐like loss. It opens a path for the interesting applications such as solar thermophotovoltaics and optical circuits. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgh2sx11hn2" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>