Back Cover: Plasma Process. Polym. 11∕2014. Issue 11 (November 2014)

• Record Type: Journal Article
• Authors: Vandenabeele, Cédric; Maurau, Rémy; Bulou, Simon; Siffer, Frederic; Gérard, Mathieu; Belmonte, Thierry; Choquet, Patrick
• Is Part Of: Plasma processes and polymers. Volume 11:Issue 11(2014:Nov.)
• Page Start: 1112
• Page End: 1112
• Publication Date: 2014-11
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201470045
• Languages: English
• ISSNs: 1612-8850

Abstract

<abstract abstract-type="graphical"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Back Cover:</bold> Organo‐chlorinated thin films are produced from dichloromethane on zinc‐plated steel wires in a continuous‐flow AP‐DBD plasma process. High quality layers can be deposited at high deposition rates. A wide range of chlorinated species are created in the Ar discharge, ranging from small volatile gaseous molecules to large‐sized PAH. An increase in the injected energy induces a decrease in hydrogen concentration in the coating that becomes closer to a graphite structure. Further details can be found in the article by Simon Bulou et. al. <ext-link ext-link-type="uri" xlink:href="http://doi.wiley.com/10.1002/ppap.201400098" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink">on page 1089</ext-link>. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgh2ckn3hr2" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>