Continuous Deposition of Organo‐Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire‐Cylinder Configuration. Issue 11 (18th October 2014)

• Record Type: Journal Article
• Authors: Vandenabeele, Cédric; Maurau, Rémy; Bulou, Simon; Siffer, Frederic; Gérard, Mathieu; Belmonte, Thierry; Choquet, Patrick
• Is Part Of: Plasma processes and polymers. Volume 11:Issue 11(2014:Nov.)
• Page Start: 1089
• Page End: 1101
• Publication Date: 2014-10-18
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201400098
• Languages: English
• ISSNs: 1612-8850

Abstract

<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="ppap201400098-sec-0001" sec-type="section"> <p>On‐line atmospheric pressure plasma treatment of cylindrical substrates is of great interest in tire industry in view of developing a cheaper and cleaner process than electrolytic plating ones that are applied on metallic tire reinforcing materials. Here we assess the feasibility of such a continuous treatment by depositing organo‐chlorinated thin films from dichloromethane on zinc‐plated steel wires crossing a tubular dielectric barrier discharge. We show that working conditions highly influence layers growth and have to be carefully adjusted for obtaining homogeneous and defect‐free coatings. Thin films chemistry is strongly dependent on the energy injected in the discharge. Layers become more inorganic when power increases, resembling carbon black or graphite and no longer hydrocarbon.<inline-graphic xlink:href="ark:/27927/pgh2ckn3hsm" content-type="ppap201400098-gra-0001" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </sec> </abstract>