Multifunctional Three‐Dimensional T‐Junction Graphene Micro‐Wells: Energy‐Efficient, Plasma‐Enabled Growth and Instant Water‐Based Transfer for Flexible Device Applications. (19th August 2014)
- Record Type:
- Journal Article
- Title:
- Multifunctional Three‐Dimensional T‐Junction Graphene Micro‐Wells: Energy‐Efficient, Plasma‐Enabled Growth and Instant Water‐Based Transfer for Flexible Device Applications. (19th August 2014)
- Main Title:
- Multifunctional Three‐Dimensional T‐Junction Graphene Micro‐Wells: Energy‐Efficient, Plasma‐Enabled Growth and Instant Water‐Based Transfer for Flexible Device Applications
- Authors:
- Kumar, Shailesh
van der Laan, Timothy
Rider, Amanda Evelyn
Randeniya, Lakshman
Ostrikov, Kostya (Ken) - Abstract:
- <abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>The "third‐generation" 3D graphene structures, T‐junction graphene micro‐wells (T‐GMWs) are produced on cheap polycrystalline Cu foils in a single‐step, low‐temperature (270 °C), energy‐efficient, and environment‐friendly dry plasma‐enabled process. T‐GMWs comprise vertical graphene (VG) petal‐like sheets that seemlessly integrate with each other and the underlying horizontal graphene sheets by forming T‐junctions. The microwells have the pico‐to‐femto‐liter storage capacity and precipitate compartmentalized PBS crystals. The T‐GMW films are transferred from the Cu substrates, without damage to the both, in de‐ionized or tap water, at room temperature, and without commonly used sacrificial materials or hazardous chemicals. The Cu substrates are then re‐used to produce similar‐quality T‐GMWs after a simple plasma conditioning. The isolated T‐GMW films are transferred to diverse substrates and devices and show remarkable recovery of their electrical, optical, and hazardous NO<sub>2</sub> gas sensing properties upon repeated bending (down to 1 mm radius) and release of flexible trasparent display plastic substrates. The plasma‐enabled mechanism of T‐GMW isolation in water is proposed and supported by the Cu plasma surface modification analysis. Our GMWs are suitable for various optoelectronic, sesning, energy, and biomedical applications while the growth approach is<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>The "third‐generation" 3D graphene structures, T‐junction graphene micro‐wells (T‐GMWs) are produced on cheap polycrystalline Cu foils in a single‐step, low‐temperature (270 °C), energy‐efficient, and environment‐friendly dry plasma‐enabled process. T‐GMWs comprise vertical graphene (VG) petal‐like sheets that seemlessly integrate with each other and the underlying horizontal graphene sheets by forming T‐junctions. The microwells have the pico‐to‐femto‐liter storage capacity and precipitate compartmentalized PBS crystals. The T‐GMW films are transferred from the Cu substrates, without damage to the both, in de‐ionized or tap water, at room temperature, and without commonly used sacrificial materials or hazardous chemicals. The Cu substrates are then re‐used to produce similar‐quality T‐GMWs after a simple plasma conditioning. The isolated T‐GMW films are transferred to diverse substrates and devices and show remarkable recovery of their electrical, optical, and hazardous NO<sub>2</sub> gas sensing properties upon repeated bending (down to 1 mm radius) and release of flexible trasparent display plastic substrates. The plasma‐enabled mechanism of T‐GMW isolation in water is proposed and supported by the Cu plasma surface modification analysis. Our GMWs are suitable for various optoelectronic, sesning, energy, and biomedical applications while the growth approach is potentially scalable for future pilot‐scale industrial production.</p> </abstract> … (more)
- Is Part Of:
- Advanced functional materials. Volume 24:Number 39(2014)
- Journal:
- Advanced functional materials
- Issue:
- Volume 24:Number 39(2014)
- Issue Display:
- Volume 24, Issue 39 (2014)
- Year:
- 2014
- Volume:
- 24
- Issue:
- 39
- Issue Sort Value:
- 2014-0024-0039-0000
- Page Start:
- 6114
- Page End:
- 6122
- Publication Date:
- 2014-08-19
- Subjects:
- Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.201400992 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 3603.xml