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Kim, E. et al. (2014). A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub‐10 nm Microdomains in Si‐Containing Block Copolymer Thin Films. Advanced functional materials. pp. 6981-6988. [Online].
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Kim, E. et al. (2014). A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub‐10 nm Microdomains in Si‐Containing Block Copolymer Thin Films. Advanced functional materials. pp. 6981-6988. [Online].