Full‐field X‐ray reflection microscopy of epitaxial thin‐films. (2nd October 2014)

• Record Type: Journal Article
• Authors: Laanait, Nouamane; Zhang, Zhan; Schlepütz, Christian M.; Vila‐Comamala, Joan; Highland, Matthew J.; Fenter, Paul
• Is Part Of: Journal of synchrotron radiation. Volume 21:Part 6(2014)
• Page Start: 1252
• Page End: 1261
• Publication Date: 2014-10-02
• Subjects: Synchrotron radiation -- Periodicals; Free electron lasers -- Periodicals; 539.73505
• DOI: 10.1107/S1600577514016555
• Languages: English
• ISSNs: 0909-0495

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Novel X‐ray imaging of structural domains in a ferroelectric epitaxial thin film using diffraction contrast is presented. The full‐field hard X‐ray microscope uses the surface scattering signal, in a reflectivity or diffraction experiment, to spatially resolve the local structure with 70 nm lateral spatial resolution and sub‐nanometer height sensitivity. Sub‐second X‐ray exposures can be used to acquire a 14 µm × 14 µm image with an effective pixel size of 20 nm on the sample. The optical configuration and various engineering considerations that are necessary to achieve optimal imaging resolution and contrast in this type of microscopy are discussed.</p> </abstract>