Study of multilayer ZnO/Al doped ZnO nanostructured thin films. (October 2014)

• Record Type: Journal Article
• Authors: Rahman, A.; Jayaganthan, R.; Sharma, J. V. N.
• Is Part Of: Surface engineering. Volume 30:Number 10(2014)
• Page Start: 709
• Page End: 715
• Publication Date: 2014-10
• Subjects: Surfaces (Technology) -- Periodicals; Coatings -- Periodicals; 620.4405
• DOI: 10.1179/1743294414Y.0000000316
• Languages: English
• ISSNs: 0267-0844

Abstract

<abstract> <title> <x content-type="archive" xml:space="preserve">Abstract</x> </title> <p>Single layer (ZnO, ZnS and Al doped ZnO film), double layer (ZnO/Al doped ZnO film) and triple layer films (ZnO/Al doped ZnO/ZnO and ZnO/Al doped ZnO/ZnS film) were deposited on sodalime glass substrate by electroless process. Wet deposited thin films were dried in air and subsequently annealed in a muffle furnace in air atmosphere at 500°C for 2 h. Significant characteristics of the thin films, such as crystallinity, surface roughness, as well as the optical properties in a large spectral range between 300 and 800 nm were analysed. Average grain size of the films was found 40–90 nm. The obtained sample of triple layer film of ZnO/Al doped ZnO/ZnS exhibits best, optimum optical characteristics, i.e. intermediate range of absorbance of spectra, lowest value of photoluminescence intensity, and has minimum recombination of electron–hole pairs. Triple layer film of ZnO/Al doped ZnO/ZnS is suitable in place of CdS/Al doped ZnO multilayer film as a transparent substrate in dye-sensitised solar cell.</p> </abstract>