In Situ Controlled Growth of Titanium Nitride in Amorphous Silicon Nitride: A General Route Toward Bulk Nitride Nanocomposites with Very High Hardness. (5th August 2014)

• Record Type: Journal Article
• Authors: Bechelany, Mirna Chaker; Proust, Vanessa; Gervais, Christel; Ghisleni, Rudy; Bernard, Samuel; Miele, Philippe
• Is Part Of: Advanced materials. Volume 26:Number 38(2014)
• Page Start: 6548
• Page End: 6553
• Publication Date: 2014-08-05
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201402356
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en" id="adma201402356-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Bulk nanocomposites</bold> possessing very high hardness in which TiN nanocrystallites are homogeneously embedded in an amorphous Si₃N₄ matrix are produced from perhydropolysilazane and tetrakisdimethylaminotitanium. That is, a low‐molecular‐weight TiN molecule is mixed in controlled molar ratio with a polymeric Si₃N₄ precursor; further processing, including ammonolysis, warm pressing, and controlled nanocrystal growth, yields nanocomposites with the desired properties. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgh1fbr9t76" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>