Directed Growth of Electroactive Metal‐Organic Framework Thin Films Using Electrophoretic Deposition. (28th July 2014)

• Record Type: Journal Article
• Authors: Hod, Idan; Bury, Wojciech; Karlin, David M.; Deria, Pravas; Kung, Chung‐Wei; Katz, Michael J.; So, Monica; Klahr, Benjamin; Jin, Danni; Chung, Yip‐Wah; Odom, Teri W.; Farha, Omar K.; Hupp, Joseph T.
• Is Part Of: Advanced materials. Volume 26:Number 36(2014)
• Page Start: 6295
• Page End: 6300
• Publication Date: 2014-07-28
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201401940
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en" id="adma201401940-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Electrophoretic deposition (EPD)</bold> is used to assemble metal–organic framework (MOF) materials in nano‐ and micro‐particulate, thin‐film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU‐1000, UiO‐66, HKUST‐1, and Al‐MIL‐53. Additionally, EPD is used to pattern the growth of NU‐1000 thin films that exhibit full electrochemical activity. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgh1f8bcvtv" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>