Bleaching of the post‐IR IRSL signal: new insights for feldspar luminescence dating. (29th April 2014)

• Record Type: Journal Article
• Authors: Kars, Romée H.; Reimann, Tony; Ankjærgaard, Christina; Wallinga, Jakob
• Is Part Of: Boreas. Volume 43:Number 4(2014:Oct.)
• Page Start: 780
• Page End: 791
• Publication Date: 2014-04-29
• Subjects: Geology, Stratigraphic -- Quaternary -- Periodicals; 551.79
• DOI: 10.1111/bor.12082
• Languages: English
• ISSNs: 0300-9483

Abstract

<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Post‐infrared (pIR) stimulated luminescence dating of sedimentary feldspar largely avoids the effects of anomalous fading that affect conventional infrared stimulated luminescence (IRSL) dating. However, optical resetting of pIR signals is more difficult than resetting the conventional IRSL signal, which may undermine the crucial assumption that pIR signals were effectively bleached upon deposition and burial of sediment grains. In this study, we quantify the bleaching properties of several pIR signals on various samples using laboratory‐simulated bleaching in full sunlight and water‐attenuated sunlight. Our data show that bleaching is most efficient under full spectrum conditions for all pIR signals and that pIR signals measured at elevated temperature are increasingly harder to bleach than IR and pIR signals measured at low temperature (e.g. IR at 50°C). All bleaching curves exhibit a very slow and steady decrease, indicating that a fixed un‐bleachable residual level cannot be reached within the 11 days of solar simulator exposure undertaken here. We show that the magnitude of a laboratory‐determined residual dose depends on the adopted bleaching protocol and cannot be used as a proxy for the dose that remains in the sample at the time of burial (remnant dose). Our data emphasize the importance of finding a balance between sufficient signal stability and a minimized contribution of a remnant dose when using pIR procedures for feldspar luminescence dating.</p> </abstract>