P.37: Novel Gray‐toneless Technology for Mask Reduction in High Aperture Rate FFS Mode. Issue 1 (1st July 2013)

• Record Type: Journal Article
• Authors: Choi, Seungjin; Sun, Shuang; Kim, Kiyong; Niu, Jing; Zhang, Fangzhen; Kang, Minsung; Jung, Bongkwan; Song, Youngjin; Hui, Guanbao; Xue, Jianshe
• Is Part Of: Digest of technical papers. Volume 44:Issue 1(2013)
• Page Start: 1126
• Page End: 1129
• Publication Date: 2013-07-01
• Subjects: Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/j.2168-0159.2013.tb06424.x
• Languages: English
• ISSNs: 0097-966X

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>In this paper, we have successfully developed novel gray‐toneless technology for mask reduction in high aperture rate FFS mode. The key processes are the gray‐toneless technology and new PIC (pixel ITO plus channel) processes. These new technologies are able to protect channel area from pixel ITO processes and decrease defect rate of data line open due to having double layer structure. Also Panel quality was improved by reducing capacitance change between Pixel and Data line through PIC processes.</p> </abstract>