Back Cover: Plasma Process. Polym. 9∕2014. Issue 9 (September 2014)

• Record Type: Journal Article
• Authors: Rubín de Celis, David; Chen, Zhiqiang; Rahman, Md Mohklesur; Tao, Tao; McCulloch, Dougal G.; Field, Matthew R.; Lamb, Peter R.; Chen, Ying; Dai, Xiujuan J.
• Is Part Of: Plasma processes and polymers. Volume 11:Issue 9(2014:Sep.)
• Page Start: 904
• Page End: 904
• Publication Date: 2014-09
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201470037
• Languages: English
• ISSNs: 1612-8850

Abstract

<abstract abstract-type="graphical"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Back Cover:</bold> The combination of cold plasma with thermal treatment enables doping and changed growth of semiconductors that cannot be achieved by either treatment alone. The combination applied to commercial SnO powder produced SnO₂ with a nano‐scale polycrystalline structure and controllable nitrogen doping of up to 5 at. %. This product has potential as an improved anode material for Li‐ion batteries. Further details can be found in the article Xiujuan J. Dai et al. <ext-link ext-link-type="uri" xlink:href="http://doi.wiley.com/10.1002/ppap.201400083" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink">on page 897</ext-link>. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgh177sqn6s" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>