Electron Channeling Contrast Imaging for Non-Destructive Analysis of Extended Defects in Semiconductor Thin Films and Device Structures. (August 2014)

Record Type:
Journal Article
Title:
Electron Channeling Contrast Imaging for Non-Destructive Analysis of Extended Defects in Semiconductor Thin Films and Device Structures. (August 2014)
Main Title:
Electron Channeling Contrast Imaging for Non-Destructive Analysis of Extended Defects in Semiconductor Thin Films and Device Structures
Authors:
Katz, M.B.
Twigg, M.E.
Maximenko, S.I.
Bassim, N.D.
Mahadik, N.A.
Jernigan, G.G.
Canedy, C.L.
Abell, J.
Affouda, C.A.
Abstract:
Is Part Of:
Microscopy and microanalysis. Volume 20:Number 3(2014:Jun.)
Journal:
Microscopy and microanalysis
Issue:
Volume 20:Number 3(2014:Jun.)
Issue Display:
Volume 20, Issue 3 (2014)
Year:
2014
Volume:
20
Issue:
3
Issue Sort Value:
2014-0020-0003-0000
Page Start:
1064
Page End:
1065
Publication Date:
2014-08
Subjects:
Microscopy -- Periodicals
Microchemistry -- Periodicals
502.82
Journal URLs:
https://academic.oup.com/mam ↗
http://journals.cambridge.org/action/displayJournal?jid=MAM ↗
http://link.springer.de/link/service/journals/10005/index.htm ↗
http://firstsearch.oclc.org ↗
DOI:
10.1017/S1431927614007041 ↗
Languages:
English
ISSNs:
1431-9276
Deposit Type:
Legaldeposit
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:
British Library HMNTS - ELD Digital store
Ingest File:
3374.xml