In Situ Biasing of Tapered Si-Ge NW Heterojunctions using Off-Axis Electron Holography. (August 2014)

Record Type:: Journal Article
Title:: In Situ Biasing of Tapered Si-Ge NW Heterojunctions using Off-Axis Electron Holography. (August 2014)
Main Title:: In Situ Biasing of Tapered Si-Ge NW Heterojunctions using Off-Axis Electron Holography
Authors:: Gan, Z.
Perea, D.
He, Y.
Colby, R.
Gu, M.
Jinkyoung, Y.
Wang, C.
Picraux, S. T.
Smith, D. J.
McCartney, M. R.
Abstract:
Is Part Of:: Microscopy and microanalysis. Volume 20:Number 3(2014:Jun.)
Journal:: Microscopy and microanalysis
Issue:: Volume 20:Number 3(2014:Jun.)
Issue Display:: Volume 20, Issue 3 (2014)
Year:: 2014
Volume:: 20
Issue:: 3
Issue Sort Value:: 2014-0020-0003-0000
Page Start:: 256
Page End:: 257
Publication Date:: 2014-08
Subjects:: Microscopy -- Periodicals
Microchemistry -- Periodicals
502.82
Journal URLs:: https://academic.oup.com/mam ↗
http://journals.cambridge.org/action/displayJournal?jid=MAM ↗
http://link.springer.de/link/service/journals/10005/index.htm ↗
http://firstsearch.oclc.org ↗
DOI:: 10.1017/S1431927614003006 ↗
Languages:: English
ISSNs:: 1431-9276
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library HMNTS - ELD Digital store
Ingest File:: 3370.xml