Low‐temperature plasma for compositional depth profiling of crosslinking organic multilayers: comparison with C60 and giant argon gas cluster sources. (30th September 2014)
- Record Type:
- Journal Article
- Title:
- Low‐temperature plasma for compositional depth profiling of crosslinking organic multilayers: comparison with C60 and giant argon gas cluster sources. (30th September 2014)
- Main Title:
- Low‐temperature plasma for compositional depth profiling of crosslinking organic multilayers: comparison with C60 and giant argon gas cluster sources
- Authors:
- Muramoto, Shin
Rading, Derk
Bush, Brian
Gillen, Greg
Castner, David G. - Abstract:
- <abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="rcm6981-sec-0001" sec-type="section"> <title>RATIONALE</title> <p>For organic electronics, device performance can be affected by interlayer diffusion across interfaces. Time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS) can resolve buried structures with nanometer resolution, but instrument artifacts make this difficult. Low‐temperature plasma (LTP) is suggested as a way to prepare artifact‐free surfaces for accurate determination of chemical diffusion.</p> </sec> <sec id="rcm6981-sec-0002" sec-type="section"> <title>METHODS</title> <p>A model organic layer system consisting of three 1 nm delta layers of 2, 9‐dimethyl‐4, 7‐diphenyl‐1, 10‐phenanthroline (BCP) separated by three 30 nm layers of tris(8‐hydroxyquinolinato)aluminum (Alq3) was used to evaluate the effectiveness of LTP etching for the preparation of crater edge surfaces for subsequent compositional depth profile analysis. This was compared with depth profiles obtained using an instrument equipped with an argon cluster sputter source.</p> </sec> <sec id="rcm6981-sec-0003" sec-type="section"> <title>RESULTS</title> <p>The quality of the depth profiles was determined by comparing the depth resolutions of the BCP delta layers. The full width at half maximum gave depth resolutions of 6.9 nm and 6.0 nm using LTP, and 6.2 nm and 5.8 nm using argon clusters. In comparison, the 1/e decay length of the trailing edge gave<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="rcm6981-sec-0001" sec-type="section"> <title>RATIONALE</title> <p>For organic electronics, device performance can be affected by interlayer diffusion across interfaces. Time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS) can resolve buried structures with nanometer resolution, but instrument artifacts make this difficult. Low‐temperature plasma (LTP) is suggested as a way to prepare artifact‐free surfaces for accurate determination of chemical diffusion.</p> </sec> <sec id="rcm6981-sec-0002" sec-type="section"> <title>METHODS</title> <p>A model organic layer system consisting of three 1 nm delta layers of 2, 9‐dimethyl‐4, 7‐diphenyl‐1, 10‐phenanthroline (BCP) separated by three 30 nm layers of tris(8‐hydroxyquinolinato)aluminum (Alq3) was used to evaluate the effectiveness of LTP etching for the preparation of crater edge surfaces for subsequent compositional depth profile analysis. This was compared with depth profiles obtained using an instrument equipped with an argon cluster sputter source.</p> </sec> <sec id="rcm6981-sec-0003" sec-type="section"> <title>RESULTS</title> <p>The quality of the depth profiles was determined by comparing the depth resolutions of the BCP delta layers. The full width at half maximum gave depth resolutions of 6.9 nm and 6.0 nm using LTP, and 6.2 nm and 5.8 nm using argon clusters. In comparison, the 1/e decay length of the trailing edge gave depth resolutions of 2.0 nm and 1.8 nm using LTP, and 3.5 nm and 3.4 nm using argon clusters.</p> </sec> <sec id="rcm6981-sec-0004" sec-type="section"> <title>CONCLUSIONS</title> <p>The comparison of the 1/e decay lengths showed that LTP can determine the thickness and composition of the buried structures without instrument artifacts. Although it does suffer from contaminant deposition, LTP was shown to be a viable option for preparing crater edges for a more accurate determination of buried structures. Copyright © 2014 John Wiley &amp; Sons, Ltd.</p> </sec> </abstract> … (more)
- Is Part Of:
- Rapid communications in mass spectrometry. Volume 28:Number 18(2014)
- Journal:
- Rapid communications in mass spectrometry
- Issue:
- Volume 28:Number 18(2014)
- Issue Display:
- Volume 28, Issue 18 (2014)
- Year:
- 2014
- Volume:
- 28
- Issue:
- 18
- Issue Sort Value:
- 2014-0028-0018-0000
- Page Start:
- 1971
- Page End:
- 1978
- Publication Date:
- 2014-09-30
- Subjects:
- Mass spectrometry -- Periodicals
543.65 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/rcm.6981 ↗
- Languages:
- English
- ISSNs:
- 0951-4198
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 7254.440000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 3553.xml