Effect of Ge/Al thickness on Al‐induced crystallization of amorphous Ge layers on glass substrates. Issue 12 (11th November 2013)

• Record Type: Journal Article
• Authors: Nakazawa, K.; Toko, K.; Saitoh, N.; Yoshizawa, N.; Usami, N.; Suemasu, T.; Maeda, Yoshihito; Suzuki, Motofumi
• Is Part Of: Physica status solidi. Volume 10:Issue 12(2013:Dec.)
• Page Start: 1781
• Page End: 1784
• Publication Date: 2013-11-11
• Subjects: Solid state physics -- Congresses; Solid state physics -- Periodicals; Solid state physics; Conference proceedings; Periodicals; 530.41
• DOI: 10.1002/pssc.201300340
• Languages: English
• ISSNs: 1862-6351

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>Low‐temperature (350 °C) crystallization of amorphous Ge films on SiO₂ was investigated using Al‐induced layer exchange (ALILE) process. Thicknesses of Ge and catalytic Al layers were varied in the range of 30‐300 nm, which strongly influenced the ALILE growth morphology. Based on the study, the Ge thickness was adjusted to 40 nm while the Al thickness was adjusted 50 nm. This sample satisfied both of the surface coverage of polycrystalline‐Ge and the annihilation of randomly oriented Ge regions. Moreover, the enhancement of the heterogeneous Ge nucleation improved the (111) orientation and the grain size. As a result, the area fraction of the (111)‐orientation reached as high as 97% and the average grain size as large as 70‐μm diameters. This (111)‐oriented Ge layer with large‐grains promises to be the high‐quality epitaxial template for various functional materials to achieve next‐generation devices. (© 2013 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim)</p> </abstract>