Measurement of oxygen chemical diffusion in PuO2‐x and analysis of oxygen diffusion in PuO2‐x and (Pu, U)O2‐x. Issue 2 (18th December 2012)

• Record Type: Journal Article
• Authors: Kato, Masato; Uchida, Teppei; Sunaoshi, Takeo; Stanek, Christopher R.; Nikl, Martin; Kovács, László; Greulich‐Weber, Siegmund
• Is Part Of: Physica status solidi. Volume 10:Issue 2(2013:Feb.)
• Page Start: 189
• Page End: 192
• Publication Date: 2012-12-18
• Subjects: Solid state physics -- Congresses; Solid state physics -- Periodicals; Solid state physics; Conference proceedings; Periodicals; 530.41
• DOI: 10.1002/pssc.201200454
• Languages: English
• ISSNs: 1862-6351

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>Oxygen chemical diffusion in PuO_{2‐<italic>x</italic>} was investigated in the temperature range of 1473‐1873 K by thermogravimetry as functions of oxygen‐to‐metal (O/M) ratios and temperatures. The oxygen chemical diffusion coefficients, <tex-math notation="tex"><![CDATA[$ \tilde D $]]></tex-math><inline-graphic xlink:href="ark:/27927/pgh6nd00c7" mimetype="image" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /> were determined assuming that the reduction curves were dominated by a diffusion process. The O/M ratio and Pu content dependence on the chemical diffusion coefficients were evaluated. The chemical diffusion coefficient had its minimum value at around O/M=1.98 and decreased with increasing Pu content in (U, Pu)O_{2‐<italic>x</italic>}. The self‐diffusion coefficients were evaluated. A model for describing the relationship among O/M ratio, oxygen chemical diffusion, and self‐diffusion was proposed based on defect chemistry. (© 2012 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim)</p> </abstract>