Electrical properties related to the structure of GeSi nanostructured films. Issue 7 (22nd January 2014)
- Record Type:
- Journal Article
- Title:
- Electrical properties related to the structure of GeSi nanostructured films. Issue 7 (22nd January 2014)
- Main Title:
- Electrical properties related to the structure of GeSi nanostructured films
- Authors:
- Ciurea, Magdalena Lidia
Stavarache, Ionel
Lepadatu, Ana‐Maria
Pasuk, Iuliana
Teodorescu, Valentin Serban - Abstract:
- <abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="pssb201350112-sec-0001" sec-type="section"> <p>GeSi nanostructured films were obtained by cosputtering from two Ge and Si targets and subsequent annealing in furnace in N<sub>2</sub> for 5 h at 700, 800 and 900 °C, with the aim to show the correlation between electrical properties and crystalline structure of the films. The as‐deposited films are amorphous, have a Ge:Si composition of 55:45 and 185 nm thickness. The film structure was investigated by XRD and TEM, and the electrical behaviour was studied by measuring current–voltage (<italic>I</italic>–<italic>V</italic>) and current–temperature (<italic>I</italic>–<italic>T</italic>) characteristics and by discussing them in correlation with the structure. Different electrical behaviours of GeSi films corresponding to different structures have been evidenced. The 700 °C annealed GeSi films are formed of nanocrystals (7–15 nm) separated by amorphous regions (1–2 nm). These films present a superlinear <italic>I</italic>–<italic>V</italic> characteristic typical of high field‐assisted tunnelling through potential barriers (amorphous regions) between nanocrystals. The <italic>I</italic>–<italic>T</italic> characteristic at low temperature follows a <italic>T</italic><sup>−1/2</sup> law showing a thermally activated tunnelling of carriers between neighboring GeSi nanocrystals. The films annealed at 800 and 900 °C have a like behavior,<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="pssb201350112-sec-0001" sec-type="section"> <p>GeSi nanostructured films were obtained by cosputtering from two Ge and Si targets and subsequent annealing in furnace in N<sub>2</sub> for 5 h at 700, 800 and 900 °C, with the aim to show the correlation between electrical properties and crystalline structure of the films. The as‐deposited films are amorphous, have a Ge:Si composition of 55:45 and 185 nm thickness. The film structure was investigated by XRD and TEM, and the electrical behaviour was studied by measuring current–voltage (<italic>I</italic>–<italic>V</italic>) and current–temperature (<italic>I</italic>–<italic>T</italic>) characteristics and by discussing them in correlation with the structure. Different electrical behaviours of GeSi films corresponding to different structures have been evidenced. The 700 °C annealed GeSi films are formed of nanocrystals (7–15 nm) separated by amorphous regions (1–2 nm). These films present a superlinear <italic>I</italic>–<italic>V</italic> characteristic typical of high field‐assisted tunnelling through potential barriers (amorphous regions) between nanocrystals. The <italic>I</italic>–<italic>T</italic> characteristic at low temperature follows a <italic>T</italic><sup>−1/2</sup> law showing a thermally activated tunnelling of carriers between neighboring GeSi nanocrystals. The films annealed at 800 and 900 °C have a like behavior, they are completely crystallized and present linear <italic>I</italic>–<italic>V</italic> and Arrhenius <italic>I</italic>–<italic>T</italic> dependences reflecting the polycrystalline behaviour. <inline-graphic xlink:href="ark:/27927/pghqqrqqtk" content-type="pssb201350112-gra-0001" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </sec> </abstract> … (more)
- Is Part Of:
- Physica status solidi. Volume 251:Issue 7(2014:Jul.)
- Journal:
- Physica status solidi
- Issue:
- Volume 251:Issue 7(2014:Jul.)
- Issue Display:
- Volume 251, Issue 7 (2014)
- Year:
- 2014
- Volume:
- 251
- Issue:
- 7
- Issue Sort Value:
- 2014-0251-0007-0000
- Page Start:
- 1340
- Page End:
- 1346
- Publication Date:
- 2014-01-22
- Subjects:
- Solid state physics -- Periodicals
Solids -- Periodicals
Atomic structure -- Periodicals
530.41 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-3951 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/pssb.201350112 ↗
- Languages:
- English
- ISSNs:
- 0370-1972
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6475.230000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 4103.xml