A General Route Towards Defect and Pore Engineering in Graphene. Issue 11 (7th March 2014)

• Record Type: Journal Article
• Authors: Xie, Guibai; Yang, Rong; Chen, Peng; Zhang, Jing; Tian, Xuezeng; Wu, Shuang; Zhao, Jing; Cheng, Meng; Yang, Wei; Wang, Duoming; He, Congli; Bai, Xuedong; Shi, Dongxia; Zhang, Guangyu
• Is Part Of: Small. Volume 10:Issue 11(2014:Jun.)
• Page Start: 2280
• Page End: 2284
• Publication Date: 2014-03-07
• Subjects: Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.201303671
• Languages: English
• ISSNs: 1613-6810

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Defect engineering in graphene is important for tailoring graphene's properties thus applicable in various applications such as porous membranes and ultra‐capacitors. In this paper, we report a general route towards defect‐ and pore‐ engineering in graphene through remote plasma treatments. Oxygen plasma irradiation was employed to create homogenous defects in graphene with controllable density from a few to ≈10³ (μm⁻²). The created defects can be further enlarged into nanopores by hydrogen plasma anisotropic etching with well‐defined pore size of a few nm or above. The achieved smallest nanopores are ≈2 nm in size, showing the potential for ultra‐small graphene nanopores fabrication.</p> </abstract>