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HARVARD Citation
Prasanna, S. et al. (2014). Effect of post-deposition annealing on composition and electrical properties of dc reactive magnetron sputtered Al2O3 thin films. Materials technology. pp. 83-89. [Online].
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Prasanna, S. et al. (2014). Effect of post-deposition annealing on composition and electrical properties of dc reactive magnetron sputtered Al2O3 thin films. Materials technology. pp. 83-89. [Online].