Conductive Transparent TiNx/TiO2 Hybrid Films Deposited on Plastics in Air Using Atmospheric Plasma Processing. (28th January 2014)

• Record Type: Journal Article
• Authors: Dong, Siming; Watanabe, Makoto; Dauskardt, Reinhold H.
• Is Part Of: Advanced functional materials. Volume 24:Number 20(2014)
• Page Start: 3075
• Page End: 3081
• Publication Date: 2014-01-28
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adfm.201303038
• Languages: English
• ISSNs: 1616-301X

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>The successful deposition of conductive transparent TiN_x/TiO₂ hybrid films on both polycarbonate and silicon substrates from a titanium ethoxide precursor is demonstrated in air using atmospheric plasma processing equipped with a high‐temperature precursor delivery system. The hybrid film chemical composition, deposition rates, optical and electrical properties along with the adhesion energy to the polycarbonate substrate are investigated as a function of plasma power and plasma gas composition. The film is a hybrid of amorphous and crystalline rutile titanium oxide phases and amorphous titanium nitride that depend on the processing conditions. The visible transmittance increases from 71% to 83% with decreasing plasma power and increasing nitrogen content of the plasma gas. The film resistivity is in the range of ∼8.5 × 10¹ to 2.4 × 10⁵ ohm cm. The adhesion energy to the polycarbonate substrate varies from ∼1.2 to 8.5 J/m² with increasing plasma power and decreasing plasma gas nitrogen content. Finally, annealing the film or introducing hydrogen to the primary plasma gas significantly affects the composition and decreases thin‐film resistivity.</p> </abstract>