XeF2/Fluoride Acceptors as Versatile One‐Electron Oxidants1. Issue 49 (11th October 2013)

• Record Type: Journal Article
• Authors: Poleschner, Helmut; Seppelt, Konrad
• Is Part Of: Angewandte Chemie international edition. Volume 52:Issue 49(2013)
• Page Start: 12838
• Page End: 12842
• Publication Date: 2013-10-11
• Subjects: Chemistry -- Periodicals; 540
• DOI: 10.1002/anie.201307161
• Languages: English
• ISSNs: 1433-7851

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>No phlogiston</bold> but xenon is released when XeF₂/F⁻ acceptors act as new one‐electron oxidants. F⁻ acceptors are Lewis acids BF₃, B(C₆F₅)₃, and Al{OC(CF₃)₃}₃, and silyl derivatives TfOSiMe₃, Tf₂NSiMe₃, Me₃Si⁺ B(C₆F₅)₄⁻, and Me₃Si⁺ CHB₁₁Cl₁₁⁻. The anions BF₄⁻, TfO⁻, Tf₂N⁻, FB(C₆F₅)₃⁻, FAl{OC(CF₃)₃}₃⁻, B(C₆F₅)₄⁻, or CHB₁₁Cl₁₁⁻ can be introduced into oxidation products of R₂E₂ (E=S, Se, Te), [FeCp₂], [(FeCpS)₄], tetrathiafulvalene, thianthrene, and (2, 4‐Br₂C₆H₃)₃N.<boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg4t7b0cww" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>