Activated Solutions Enabling Low‐Temperature Processing of Functional Ferroelectric Oxides for Flexible Electronics. (12th December 2013)

• Record Type: Journal Article
• Authors: Bretos, Iñigo; Jiménez, Ricardo; Wu, Aiying; Kingon, Angus I.; Vilarinho, Paula M.; Calzada, M. Lourdes
• Is Part Of: Advanced materials. Volume 26:Number 9(2014)
• Page Start: 1405
• Page End: 1409
• Publication Date: 2013-12-12
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201304308
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en" id="adma201304308-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Functional ferroelectric oxides for flexible electronics</bold> are achieved from activated solutions enabling low‐temperature processing and large‐area deposition directly on polymeric substrates. This processing technology reaches the lower limit temperature of crystallization at 300 °C, using a strategy that combines seeded diphasic precursors and photochemical solution deposition. Properties of these materials are comparable to those of high‐temperature‐processed counterparts and organic ferroelectrics. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg4sr5z46b" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>