Resistless Nanoimprinting in Metal for Plasmonic Nanostructures. Issue 22 (18th April 2013)

• Record Type: Journal Article
• Authors: Varghese, Leo T.; Fan, Li; Xuan, Yi; Tansarawiput, Chookiat; Kim, Sangsik; Qi, Minghao
• Is Part Of: Small. Volume 9:Issue 22(2013:Nov.)
• Page Start: 3778
• Page End: 3783
• Publication Date: 2013-04-18
• Subjects: Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.201300168
• Languages: English
• ISSNs: 1613-6810

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>Metal nanostructures are the main building blocks of metamaterials and plasmonics which show many extraordinary properties not existing in nature. A simple and widely applicable method that can directly pattern metals with silicon molds without the need of resists, using pressures of &lt;4 MPa and temperatures of 25–150 °C is reported. Three‐dimensional structures with smooth and vertical sidewalls, down to sub‐10 nm resolution, are generated in silver and gold films in a single patterning step. Using this nanopatterning scheme, large‐scale vivid images through extraordinary optical transmission and strong surface‐enhanced Raman scattering substrates are realized. Resistless nanoimprinting in metal (RNIM) is a new class of metal patterning that allows plasmonic nanostructures to be fabricated quickly, repeatedly, and at a low‐cost.</p> </abstract>