Cite
HARVARD Citation
Aslam, N. et al. (n.d.). Influence of stoichiometry on the performance of MIM capacitors from plasma‐assisted ALD SrxTiyOz films. Physica status solidi. 211 (2), pp. 389-396. [Online].
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Aslam, N. et al. (n.d.). Influence of stoichiometry on the performance of MIM capacitors from plasma‐assisted ALD SrxTiyOz films. Physica status solidi. 211 (2), pp. 389-396. [Online].