Design and Fabrication of Hollow Rigid Nanolattices via Two‐Photon Lithography1. Issue 2 (14th October 2013)

• Record Type: Journal Article
• Authors: Montemayor, Lauren C.; Meza, Lucas R.; Greer, Julia R.
• Is Part Of: Advanced engineering materials. Volume 16:Issue 2(2014:Feb.)
• Page Start: 184
• Page End: 189
• Publication Date: 2013-10-14
• Subjects: Materials -- Periodicals; 620.11
• DOI: 10.1002/adem.201300254
• Languages: English
• ISSNs: 1438-1656

Abstract

<abstract abstract-type="graphical"> <title> <x xml:space="preserve">Abstract</x> </title> <p>This paper presents the design and fabrication of 3‐dimensional hollow metallic nanolattices using 2‐photon lithography, shown in the figure. The ability to fabricate structures of any geometry, with resolution down to 150 nm, provides opportunities to engineer structures spanning multiple length scales with potential to capitalize on combined structural and material size effects for use in many technological applications. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg4sr4j0tz" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>