Defect Engineering in Oxide Heterostructures by Enhanced Oxygen Surface Exchange. (10th June 2013)
- Record Type:
- Journal Article
- Title:
- Defect Engineering in Oxide Heterostructures by Enhanced Oxygen Surface Exchange. (10th June 2013)
- Main Title:
- Defect Engineering in Oxide Heterostructures by Enhanced Oxygen Surface Exchange
- Authors:
- Huijben, Mark
Koster, Gertjan
Kruize, Michelle K.
Wenderich, Sander
Verbeeck, Jo
Bals, Sara
Slooten, Erik
Shi, Bo
Molegraaf, Hajo J. A.
Kleibeuker, Josee E.
van Aert, Sandra
Goedkoop, Jeroen B.
Brinkman, Alexander
Blank, Dave H. A.
Golden, Mark S.
van Tendeloo, Gustaaf
Hilgenkamp, Hans
Rijnders, Guus - Abstract:
- <abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>The synthesis of materials with well‐controlled composition and structure improves our understanding of their intrinsic electrical transport properties. Recent developments in atomically controlled growth have been shown to be crucial in enabling the study of new physical phenomena in epitaxial oxide heterostructures. Nevertheless, these phenomena can be influenced by the presence of defects that act as extrinsic sources of both doping and impurity scattering. Control over the nature and density of such defects is therefore necessary to fully understand the intrinsic materials properties and exploit them in future device technologies. Here, it is shown that incorporation of a strontium copper oxide nano‐layer strongly reduces the impurity scattering at conducting interfaces in oxide LaAlO<sub>3</sub>–SrTiO<sub>3</sub>(001) heterostructures, opening the door to high carrier mobility materials. It is proposed that this remote cuprate layer facilitates enhanced suppression of oxygen defects by reducing the kinetic barrier for oxygen exchange in the hetero‐interfacial film system. This design concept of controlled defect engineering can be of significant importance in applications in which enhanced oxygen surface exchange plays a crucial role.</p> </abstract>
- Is Part Of:
- Advanced functional materials. Volume 23:Number 42(2013)
- Journal:
- Advanced functional materials
- Issue:
- Volume 23:Number 42(2013)
- Issue Display:
- Volume 23, Issue 42 (2013)
- Year:
- 2013
- Volume:
- 23
- Issue:
- 42
- Issue Sort Value:
- 2013-0023-0042-0000
- Page Start:
- 5240
- Page End:
- 5248
- Publication Date:
- 2013-06-10
- Subjects:
- Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.201203355 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 3347.xml