An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self‐Assembly1. Issue 4 (6th December 2012)

• Record Type: Journal Article
• Authors: Byun, Myunghwan; Han, Wei; Li, Bo; Xin, Xukai; Lin, Zhiqun
• Is Part Of: Angewandte Chemie international edition. Volume 52:Issue 4(2013)
• Page Start: 1122
• Page End: 1127
• Publication Date: 2012-12-06
• Subjects: Chemistry -- Periodicals; 540
• DOI: 10.1002/anie.201208421
• Languages: English
• ISSNs: 1433-7851

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>A chemically patterned surface</bold> was formed by controlled evaporative self‐assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self‐assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.<boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg1pjpn0n5" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>