Hall effect of tetragonal and orthorhombic SrRuO3 films. Issue 3 (18th December 2012)

• Record Type: Journal Article
• Authors: Bern, Francis; Ziese, Michael; Dörr, Kathrin; Herklotz, Andreas; Vrejoiu, Ionela
• Is Part Of: Physica status solidi. Volume 7:Issue 3(2013:Mar.)
• Page Start: 204
• Page End: 206
• Publication Date: 2012-12-18
• Subjects: Solid state physics -- Periodicals; 530.4105
• DOI: 10.1002/pssr.201206500
• Languages: English
• ISSNs: 1862-6254

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>High quality orthorhombic and tetragonal SrRuO₃ thin films were grown by pulsed laser deposition on SrTiO₃(001) and Ba_0.75Sr_0.25TiO₃ buffered LaAlO₃(001) substrates. Resistivity <italic>vs.</italic> temperature curves showed a slope change at a Curie temperature of 147.5 ± 2 K for 40 nm thick films irrespective of crystalline symmetry. The Hall resistivity of both films contained an anomalous Hall contribution. The anomalous Hall coefficient was positive throughout the whole temperature range for the tetragonal film, whereas it showed a sign change at 143 K for the orthorhombic film. This is a strong indication that the Berry‐phase mechanism is the dominant anomalous Hall effect mechanism in SrRuO₃. (© 2012 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim)</p> </abstract>