The Stranski–Krastanow transition in SiGe epitaxy investigated by scanning transmission electron microscopy. Issue 1 (22nd November 2012)
- Record Type:
- Journal Article
- Title:
- The Stranski–Krastanow transition in SiGe epitaxy investigated by scanning transmission electron microscopy. Issue 1 (22nd November 2012)
- Main Title:
- The Stranski–Krastanow transition in SiGe epitaxy investigated by scanning transmission electron microscopy
- Authors:
- Walther, Thomas
Norris, David J.
Qiu, Yang
Dobbie, Andrew
Myronov, Maksym
Leadley, David R. - Abstract:
- <abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>The Stranski–Krastanow growth mode describes the transition from two‐dimensional flat strained layer epitaxy to the formation of islands that can be technologically used as quantum dots. This has so far been utilized for In(Ga)As/GaAs and Ge/Si heteroepitaxy. Here, we investigate multilayer samples of SiGe alloys grown with different germanium content and thicknesses by reduced pressure chemical vapor phase epitaxy and show that a similar transition can be found in the Si<sub>1<italic>−x</italic></sub>Ge<sub><italic>x</italic></sub>‐on‐Si system at <italic>x</italic> ≈ 0.28. Using a combination of annular dark‐field imaging and energy‐dispersive X‐ray spectroscopy in an analytical transmission electron microscope, we demonstrate that it is the total amount of Ge deposited that determines whether the layers stay flat or roughen, and it is germanium segregation that determines whether and when the transition occurs. While layers with nominally pure Ge roughen at a thickness of ∼0.5 nm, Si<sub>1<italic>−x</italic></sub>Ge<sub><italic>x</italic></sub> layers with <italic>x</italic> ≥ 0.28 stay flat for much longer, until segregated Ge at the surface leads to islanding. Layers below that critical concentration (<italic>x</italic> ≤ 0.27) can stay flat up to even higher thicknesses, possibly until dislocations will be formed. The critical thickness for the Stranski–Krastanow transition at<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>The Stranski–Krastanow growth mode describes the transition from two‐dimensional flat strained layer epitaxy to the formation of islands that can be technologically used as quantum dots. This has so far been utilized for In(Ga)As/GaAs and Ge/Si heteroepitaxy. Here, we investigate multilayer samples of SiGe alloys grown with different germanium content and thicknesses by reduced pressure chemical vapor phase epitaxy and show that a similar transition can be found in the Si<sub>1<italic>−x</italic></sub>Ge<sub><italic>x</italic></sub>‐on‐Si system at <italic>x</italic> ≈ 0.28. Using a combination of annular dark‐field imaging and energy‐dispersive X‐ray spectroscopy in an analytical transmission electron microscope, we demonstrate that it is the total amount of Ge deposited that determines whether the layers stay flat or roughen, and it is germanium segregation that determines whether and when the transition occurs. While layers with nominally pure Ge roughen at a thickness of ∼0.5 nm, Si<sub>1<italic>−x</italic></sub>Ge<sub><italic>x</italic></sub> layers with <italic>x</italic> ≥ 0.28 stay flat for much longer, until segregated Ge at the surface leads to islanding. Layers below that critical concentration (<italic>x</italic> ≤ 0.27) can stay flat up to even higher thicknesses, possibly until dislocations will be formed. The critical thickness for the Stranski–Krastanow transition at <italic>x </italic>=<italic> </italic>0.28 is <italic>d</italic> = 1.7 nm.</p> </abstract> … (more)
- Is Part Of:
- Physica status solidi. Volume 210:Issue 1(2013:Jan.)
- Journal:
- Physica status solidi
- Issue:
- Volume 210:Issue 1(2013:Jan.)
- Issue Display:
- Volume 210, Issue 1 (2013)
- Year:
- 2013
- Volume:
- 210
- Issue:
- 1
- Issue Sort Value:
- 2013-0210-0001-0000
- Page Start:
- 187
- Page End:
- 190
- Publication Date:
- 2012-11-22
- Subjects:
- Solid state physics -- Periodicals
Solids -- Industrial applications -- Periodicals
530.41 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/pssa.201200363 ↗
- Languages:
- English
- ISSNs:
- 1862-6300
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6475.210000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 3533.xml