UV Laser Processing for Semiconductor Devices. Issue 5 (4th November 2013)

• Record Type: Journal Article
• Authors: Krüger, Olaf; Grundmüller, Richard
• Is Part Of: Laser technik journal. Volume 10:Issue 5(2013:Nov.)
• Page Start: 26
• Page End: 30
• Publication Date: 2013-11-04
• Subjects: Lasers -- Periodicals; Lasers -- Périodiques; Electronic journals; 621.36605
• DOI: 10.1002/latj.201300010
• Languages: English
• ISSNs: 1613-7728

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>The application of reliable laser sources is well‐established in several fields of industry including automotive, electronics, and medical manufacturing on macro, micro, and even nanometer scales [1]. In modern semiconductor technology, silicon is the dominating material. Further materials like gallium nitride (GaN) and silicon carbide (SiC) allow for higher operating frequencies and power levels, i. e., high‐speed electronics and high‐power applications. However, their chemical and physical properties do not only allow extending the limits of silicon‐based device performance, but also call for alternative methods of processing.</p> </abstract>