New Deposition Technique for Metal Films Containing Inorganic Fullerene‐Like (IF) Nanoparticles. Issue 10 (6th May 2013)

• Record Type: Journal Article
• Authors: Goldbart, Ohad; Yoffe, Alexander; Cohen, Sidney R.; Rosentsveig, Rita; Feldman, Yishay; Rapoport, Lev; Tenne, Reshef
• Is Part Of: Chemphyschem. Volume 14:Issue 10(2013)
• Page Start: 2125
• Page End: 2131
• Publication Date: 2013-05-06
• Subjects: Chemistry, Physical and theoretical -- Periodicals; 541.05
• DOI: 10.1002/cphc.201201003
• Languages: English
• ISSNs: 1439-4235

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>This study describes a new method for fabrication of thin composite films using physical vapor deposition (PVD). Titanium (Ti) and hybrid films of titanium containing tungsten disulphide nanoparticles with inorganic fullerene‐like structure (Ti/IF‐WS₂) were fabricated with a modified PVD machine. The evaporation process includes the pulsed deposition of IF‐WS₂ by a sprayer head. This process results in IF‐WS₂ nanoparticles embedded in a Ti matrix. The layers were characterized by various techniques, which confirm the composition and structure of the hybrid film. The Ti/IF‐WS₂ shows better wear resistance and a lower friction coefficient when compared to the Ti layer or Ti substrate. The Ti/IF films show very good antireflective properties in the visible and near‐IR region. Such films may find numerous applications, for example, in the aerospace and medical technology.</p> </abstract>