Metal‐Organic Frameworks: Combining UV Lithography and an Imprinting Technique for Patterning Metal‐Organic Frameworks (Adv. Mater. 34/2013). (9th September 2013)

• Record Type: Journal Article
• Authors: Doherty, Cara M.; Grenci, Gianluca; Riccò, Raffaele; Mardel, James I.; Reboul, Julien; Furukawa, Shuhei; Kitagawa, Susumu; Hill, Anita J.; Falcaro, Paolo
• Is Part Of: Advanced materials. Volume 25:Number 34(2013)
• Page Start: 4681
• Page End: 4681
• Publication Date: 2013-09-09
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201370212
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Patterning metal‐organic frameworks (MOFs) using cheap, fast, and versatile methods is a key enabling technology for multifunctional miniaturized device fabrication. A collaborative work led by Paolo Falcaro (CSIRO ‐ Australia) demonstrates <ext-link ext-link-type="doi" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink">on page 4701</ext-link> how a combination of existing lithographic approaches, such as photolithography and imprinting, can be efficiently used for positioning different already‐prepared ultraporous crystals. Cover Image by Paolo Falcaro. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg36gzwrn2" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>