Combining UV Lithography and an Imprinting Technique for Patterning Metal‐Organic Frameworks. (24th July 2013)

• Record Type: Journal Article
• Authors: Doherty, Cara M.; Grenci, Gianluca; Riccò, Raffaele; Mardel, James I.; Reboul, Julien; Furukawa, Shuhei; Kitagawa, Susumu; Hill, Anita J.; Falcaro, Paolo
• Is Part Of: Advanced materials. Volume 25:Number 34(2013)
• Page Start: 4701
• Page End: 4705
• Publication Date: 2013-07-24
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201301383
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Thin metal‐organic framework (MOF) films</bold> are patterned using UV lithography and an imprinting technique. A UV lithographed SU‐8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab‐on‐a‐chip type devices. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg36gzwqgs" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>