Enhancing the Molecular Signature in Molecule‐Nanoparticle Networks Via Inelastic Cotunneling. (31st August 2012)

• Record Type: Journal Article
• Authors: Dayen, Jean‐Francois; Devid, Edwin; Kamalakar, Mutta Venkata; Golubev, Dmitry; Guédon, Constant; Faramarzi, Vina; Doudin, Bernard; van der Molen, Sense Jan
• Is Part Of: Advanced materials. Volume 25:Number 3(2013)
• Page Start: 400
• Page End: 404
• Publication Date: 2012-08-31
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201201550
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Charge transport in networks of nanoparticles</bold> linked by molecular spacers is investigated. Remarkably, in the regime where cotunneling dominates, the molecular signature of a device is strongly enhanced. We demonstrate that the resistance ratio of identical networks with different molecular spacers increases dramatically, from an initial value of 50 up to 10⁵, upon entering the cotunneling regime. Our work shows that intrinsic molecular properties can be amplified through nanoscale engineering. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg1p8k1d6v" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>