Development of gallium oxide power devices. Issue 1 (13th November 2013)
- Record Type:
- Journal Article
- Title:
- Development of gallium oxide power devices. Issue 1 (13th November 2013)
- Main Title:
- Development of gallium oxide power devices
- Authors:
- Higashiwaki, Masataka
Sasaki, Kohei
Kuramata, Akito
Masui, Takekazu
Yamakoshi, Shigenobu - Abstract:
- <abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="pssa201330197-sec-0001" sec-type="section"> <p>Gallium oxide (Ga<sub>2</sub>O<sub>3</sub>) is a strong contender for power electronic devices. The material possesses excellent properties such as a large bandgap of 4.7–4.9 eV for a high breakdown field of 8 MV cm<sup>−1</sup>. Low cost, high volume production of large single‐crystal β‐Ga<sub>2</sub>O<sub>3</sub> substrates can be realized by melt‐growth methods commonly adopted in the industry. High‐quality n‐type Ga<sub>2</sub>O<sub>3</sub> epitaxial thin films with controllable carrier densities were obtained by ozone molecular beam epitaxy (MBE). We fabricated Ga<sub>2</sub>O<sub>3</sub> metal‐semiconductor field‐effect transistors (MESFETs) and Schottky barrier diodes (SBDs) from single‐crystal Ga<sub>2</sub>O<sub>3</sub> substrates and MBE‐grown epitaxial wafers. The MESFETs delivered excellent device performance including an off‐state breakdown voltage (<italic>V</italic><sub>br</sub>) of over 250 V, a low leakage current of only few μA mm<sup>−1</sup>, and a high drain current on/off ratio of about four orders of magnitude. The SBDs also showed good characteristics such as near‐unity ideality factors and high reverse <italic>V</italic><sub>br</sub>. These results indicate that Ga<sub>2</sub>O<sub>3</sub> can potentially meet or even exceed the performance of Si and typical widegap semiconductors such as SiC or<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="pssa201330197-sec-0001" sec-type="section"> <p>Gallium oxide (Ga<sub>2</sub>O<sub>3</sub>) is a strong contender for power electronic devices. The material possesses excellent properties such as a large bandgap of 4.7–4.9 eV for a high breakdown field of 8 MV cm<sup>−1</sup>. Low cost, high volume production of large single‐crystal β‐Ga<sub>2</sub>O<sub>3</sub> substrates can be realized by melt‐growth methods commonly adopted in the industry. High‐quality n‐type Ga<sub>2</sub>O<sub>3</sub> epitaxial thin films with controllable carrier densities were obtained by ozone molecular beam epitaxy (MBE). We fabricated Ga<sub>2</sub>O<sub>3</sub> metal‐semiconductor field‐effect transistors (MESFETs) and Schottky barrier diodes (SBDs) from single‐crystal Ga<sub>2</sub>O<sub>3</sub> substrates and MBE‐grown epitaxial wafers. The MESFETs delivered excellent device performance including an off‐state breakdown voltage (<italic>V</italic><sub>br</sub>) of over 250 V, a low leakage current of only few μA mm<sup>−1</sup>, and a high drain current on/off ratio of about four orders of magnitude. The SBDs also showed good characteristics such as near‐unity ideality factors and high reverse <italic>V</italic><sub>br</sub>. These results indicate that Ga<sub>2</sub>O<sub>3</sub> can potentially meet or even exceed the performance of Si and typical widegap semiconductors such as SiC or GaN for ultrahigh‐voltage power switching applications.</p> </sec> </abstract> … (more)
- Is Part Of:
- Physica status solidi. Volume 211:Issue 1(2014:Jan.)
- Journal:
- Physica status solidi
- Issue:
- Volume 211:Issue 1(2014:Jan.)
- Issue Display:
- Volume 211, Issue 1 (2014)
- Year:
- 2014
- Volume:
- 211
- Issue:
- 1
- Issue Sort Value:
- 2014-0211-0001-0000
- Page Start:
- 21
- Page End:
- 26
- Publication Date:
- 2013-11-13
- Subjects:
- Solid state physics -- Periodicals
Solids -- Industrial applications -- Periodicals
530.41 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/pssa.201330197 ↗
- Languages:
- English
- ISSNs:
- 1862-6300
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6475.210000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 3051.xml