Cite
HARVARD Citation
Napolitani, E. et al. (n.d.). Role of ion mass on damage accumulation during ion implantation in Ge. Physica status solidi. 211 (1), pp. 118-121. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Napolitani, E. et al. (n.d.). Role of ion mass on damage accumulation during ion implantation in Ge. Physica status solidi. 211 (1), pp. 118-121. [Online].