Back Cover: Plasma Process. Polym. 1∕2014. Issue 1 (January 2014)

• Record Type: Journal Article
• Authors: Tsai, Chih‐Hung; Li, Yun‐Shiuan; Cheng, I‐Chun; Chen, Jian‐Zhang
• Is Part Of: Plasma processes and polymers. Volume 11:Issue 1(2014:Jan.)
• Page Start: 100
• Page End: 100
• Publication Date: 2014-01
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201470004
• Languages: English
• ISSNs: 1612-8850

Abstract

<abstract abstract-type="graphical"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Back Cover:</bold> O₂/HMDSO‐plasma‐deposited films are used as the gate dielectrics of MgZnO TFTs. The inorganic/organic component ratio can be tailored by processing parameters. While the inorganic content enhances the insulating property, the organic content improves the switching performance of the transistors. Further details can be found in the article by I‐Chun Cheng, Jian‐Zhang Chen et. al. on page 89. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg3zvzmsx1" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>