A chemically amplified molecular glass resist with an ionic photoacid generator and a single protection group. Issue 2 (2nd August 2013)

• Record Type: Journal Article
• Authors: Kasai, Tatsuaki; Higashihara, Tomoya; Ueda, Mitsuru
• Is Part Of: Journal of applied polymer science. Volume 131:Issue 2(2014:Jan. 15)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2013-08-02
• Subjects: Polymers -- Periodicals; Polymerization -- Periodicals; 668.9
• DOI: 10.1002/app.39769
• Languages: English
• ISSNs: 0021-8995

Abstract

<abstract abstract-type="main"> <title>ABSTRACT</title> <p>A molecular glass resist with an ionic photoacid generator and a single protection group (MR‐1) has been developed. MR‐1 exhibited good thermal properties, such as a 5% weight loss temperature (<italic>T</italic>_d5%) of 167°C and a glass transition temperature (<italic>T_g</italic>) of 80°C. MR‐1 showed the good sensitivity of 80 μC/cm² and high contrast of 4.9 with e‐beam exposure (50 keV). A relatively high resolution of 50 nm and low Line‐Edge‐Roughness of 3.8 nm were obtained by e‐beam exposure (100 keV). © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. <bold>2014</bold>, <italic>131</italic>, 39769.</p> </abstract>