Depth profiling of Irganox‐3114 nanoscale delta layers in a matrix of Irganox‐1010 using conventional Cs+ and O2+ ion beams. (29th October 2013)
- Record Type:
- Journal Article
- Title:
- Depth profiling of Irganox‐3114 nanoscale delta layers in a matrix of Irganox‐1010 using conventional Cs+ and O2+ ion beams. (29th October 2013)
- Main Title:
- Depth profiling of Irganox‐3114 nanoscale delta layers in a matrix of Irganox‐1010 using conventional Cs+ and O2+ ion beams
- Authors:
- Chakraborty, B.R.
Shard, A.G.
Dalai, M.K.
Sehgal, G. - Abstract:
- <abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Depth profiling of an organic reference sample consisting of Irganox 3114 layers of 3 nm thickness at depths of 51.5, 104.5, 207.6 and 310.7 nm inside a 412 nm thick Irganox 1010 matrix evaporated on a Si substrate has been studied using the conventional Cs<sup>+</sup> and O<sub>2</sub><sup>+</sup> as sputter ion beams and Bi<sup>+</sup> as the primary ion for analysis in a dual beam time‐of‐flight secondary ion mass spectrometer. The work is an extension of the Versailles Project on Advanced Materials and Standards project on depth profiling of organic multilayer materials. Cs<sup>+</sup> ions were used at energies of 500 eV, 1.0 keV and 2.0 keV and the O<sub>2</sub><sup>+</sup> ions were used at energies of 500 eV and 1.0 keV. All four Irganox 3114 layers were identified clearly in the depth profile using low mass secondary ions. The depth profile data were fitted to the empirical expression of Dowsett function and these fits are reported along with the full width at half maxima to represent the useful resolution for all the four delta layers detected. The data show that, of the conditions used in these experiments, an energy of 500 eV for both Cs<sup>+</sup> beam and O<sub>2</sub><sup>+</sup> beam provides the most useful depth profiles. The sputter yield volume per ion calculated from the slope of depth <italic>versus</italic> ion dose matches well with earlier reported data.<abstract abstract-type="main"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Depth profiling of an organic reference sample consisting of Irganox 3114 layers of 3 nm thickness at depths of 51.5, 104.5, 207.6 and 310.7 nm inside a 412 nm thick Irganox 1010 matrix evaporated on a Si substrate has been studied using the conventional Cs<sup>+</sup> and O<sub>2</sub><sup>+</sup> as sputter ion beams and Bi<sup>+</sup> as the primary ion for analysis in a dual beam time‐of‐flight secondary ion mass spectrometer. The work is an extension of the Versailles Project on Advanced Materials and Standards project on depth profiling of organic multilayer materials. Cs<sup>+</sup> ions were used at energies of 500 eV, 1.0 keV and 2.0 keV and the O<sub>2</sub><sup>+</sup> ions were used at energies of 500 eV and 1.0 keV. All four Irganox 3114 layers were identified clearly in the depth profile using low mass secondary ions. The depth profile data were fitted to the empirical expression of Dowsett function and these fits are reported along with the full width at half maxima to represent the useful resolution for all the four delta layers detected. The data show that, of the conditions used in these experiments, an energy of 500 eV for both Cs<sup>+</sup> beam and O<sub>2</sub><sup>+</sup> beam provides the most useful depth profiles. The sputter yield volume per ion calculated from the slope of depth <italic>versus</italic> ion dose matches well with earlier reported data. Copyright © 2013 John Wiley &amp; Sons, Ltd.</p> </abstract> … (more)
- Is Part Of:
- Surface and interface analysis. Volume 46:Number 1(2014:Jan.)
- Journal:
- Surface and interface analysis
- Issue:
- Volume 46:Number 1(2014:Jan.)
- Issue Display:
- Volume 46, Issue 1 (2014)
- Year:
- 2014
- Volume:
- 46
- Issue:
- 1
- Issue Sort Value:
- 2014-0046-0001-0000
- Page Start:
- 36
- Page End:
- 41
- Publication Date:
- 2013-10-29
- Subjects:
- Surfaces (Physics) -- Periodicals
Surface chemistry -- Periodicals
Thin films -- Periodicals
541.33 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/sia.5343 ↗
- Languages:
- English
- ISSNs:
- 0142-2421
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8547.742000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 3228.xml